Form 20-F X
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Form 40-F __
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SONY CORPORATION
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(Registrant)
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By: /s/ Kenichiro Yoshida
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(Signature)
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Kenichiro Yoshida
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Executive Vice President and
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Chief Financial Officer
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News & Information
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1-7-1 Konan,
Minato-ku, Tokyo
108-0075, Japan
Sony Corporation
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No. 14-070E
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July 23, 2014
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*1:
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CMOS image sensors layer, in a stacked structure, the pixel section, containing back-illuminated structure pixels, onto chips containing the circuit for signal processing, in contrast to the supporting substrates used in conventional back-illuminated CMOS image sensors.
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*2:
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The layering process refers to the layering semiconductor chips containing back-illuminated structure pixels with semiconductor chips containing the circuit for signal processing.
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*3:
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The mastering process refers to the manufacture of photodiodes and wiring processes for stacked CMOS image sensors.
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*4:
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This total production capacity (300mm wafer basis) includes the output of foundry operations to which Sony outsources a part of the manufacturing process. For the purposes of calculating total production capacity, the capacity of 200mm wafer production lines in Kagoshima Technology Center and Nagasaki TEC is converted to the new 300mm wafer production capacity basis.
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Purpose of Investment:
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Increase production capacity to meet growing demand for stacked CMOS image sensors | |
Investment site:
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Sony Semiconductor Corporation, Nagasaki Technology Center (Isahaya-shi, Nagasaki Prefecture), Kumamoto Technology Center (Kikuchi-gun, Kumamoto Prefecture) | |
Investment details:
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Nagasaki TEC Fab 2 facility: installing new equipment to manufacture CMOS image sensors (primarily from layering process onwards)
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Kumamoto TEC Fab 2 facility: installing new equipment to manufacture CMOS image sensors (mastering process)
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Investment amount:
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Approximately 35 billion yen (planned amount) | |
<Details of investment> | - |
Approximately 9 billion yen (Nagasaki TEC: approximately 3 billion, Kumamoto TEC: approximately 6 billion) scheduled to be carried out in FY14
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Approximately 26 billion yen (Nagasaki TEC) scheduled to be carried out in FY15
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(1) Head office:
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4000-1 Ooaza-haramizu, Kikuyou-machi, Kikuchi-gun, Kumamoto, Japan
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(2) Date of Establishment:
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April 1, 2001
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(3) Representative:
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Toshiro Kurusu, President and Representative Director
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(4) Capital:
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24.25 billion yen (wholly owned by Sony Corporation)
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(5) Production sites:
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Kagoshima, Oita, Nagasaki, Kumamoto, Shiroishi-Zao (Miyagi), Higashiura (Aichi) and Yamagata (as of July 2014)
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(6) Number of employees:
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Approximately 7,400 (including contract and temporary employees) as of April 2014
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(7) Business activities:
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Development, design and production of semiconductors
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(1) Location:
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1883-43, Tsukuba-machi, Isahaya-shi, Nagasaki, Japan
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(2) Date of Establishment:
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December 4, 1987
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(3) Representative:
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Yoshihiro Yamaguchi, President and Corporate Vice President, Nagasaki TEC
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(4) Site area:
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194,000m2
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(5) Floor area:
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221,000m2
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(6) Main products:
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CMOS image sensors and MOS LSIs
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(1) Location:
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4000-1 Ooaza-haramizu, Kikuyou-machi, Kikuchi-gun, Kumamoto, Japan
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(2) Date of Establishment:
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October 1, 2001
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(3) Representative:
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Hiromi Suzuki, President and Corporate Vice President, Kumamoto TEC
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(4) Site area:
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266,000m2
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(5) Floor area:
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197,000m2
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(6) Main products:
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CMOS image sensors, CCD image sensors, micro-display devices
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